Electronic properties and defect levels induced by group III substitution–interstitial complexes in Ge

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dc.contributor.author Igumbor, E.
dc.contributor.author Dongho-Nguimdo, G.M.
dc.contributor.author Mapasha, Refilwe Edwin
dc.contributor.author Meyer, Walter Ernst
dc.date.accessioned 2019-06-25T14:27:54Z
dc.date.issued 2019-08
dc.description.abstract Please read abstract in the article. en_ZA
dc.description.department Physics en_ZA
dc.description.embargo 2020-08-01
dc.description.librarian hj2019 en_ZA
dc.description.sponsorship This work is based on the research supported partly by National Research Foundation (NRF) of South Africa (Grant specific unique reference number (UID) 98961). en_ZA
dc.description.uri http://link.springer.com/journal/10853 en_ZA
dc.identifier.citation Igumbor, E., Dongho-Nguimdo, G.M., Mapasha, R.E. et al. Electronic properties and defect levels induced by group III substitution–interstitial complexes in Ge. Journal of Materials Science (2019) 54: 10798-10808. https://doi.org/10.1007/s10853-019-03627-0. en_ZA
dc.identifier.issn 0022-2461 (print)
dc.identifier.issn 1573-4803 (online)
dc.identifier.other 10.1007/s10853-019-03627-0
dc.identifier.uri http://hdl.handle.net/2263/70299
dc.language.iso en en_ZA
dc.publisher Springer en_ZA
dc.rights © Springer Science+Business Media, LLC, part of Springer Nature 2019. The original publication is available at : http://link.springer.comjournal/10853. en_ZA
dc.subject Hybrid density functional theory en_ZA
dc.subject Hybrid functional calculation en_ZA
dc.subject Ab-initio en_ZA
dc.subject Germanium (Ge) en_ZA
dc.subject Electronic properties en_ZA
dc.subject Defect levels en_ZA
dc.subject Group III substitution en_ZA
dc.title Electronic properties and defect levels induced by group III substitution–interstitial complexes in Ge en_ZA
dc.type Postprint Article en_ZA


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