A study of the T2 defect and the emission properties of the E3 deep level in annealed melt grown ZnO single crystals

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dc.contributor.author Mtangi, Wilbert
dc.contributor.author Schmidt, Matthias
dc.contributor.author Auret, Francois Danie
dc.contributor.author Meyer, Walter Ernst
dc.contributor.author Janse van Rensburg, Pieter Johan
dc.contributor.author Diale, M. (Mmantsae Moche)
dc.contributor.author Nel, Jacqueline Margot
dc.contributor.author Das, A.G.M.
dc.contributor.author Ling, F.C.C.
dc.contributor.author Chawanda, Albert
dc.date.accessioned 2013-06-05T14:03:17Z
dc.date.available 2013-06-05T14:03:17Z
dc.date.issued 2013-05-22
dc.description APPENDIX A: DECONVOLUTION OF THE E3 AND T2 DEEP LEVELS en
dc.description APPENDIX B: CALCULATION OF THE DEFECT DEPTH PROFILE en
dc.description.abstract We report on the space charge spectroscopy studies performed on thermally treated melt-grown single crystal ZnO. The samples were annealed in different ambients at 700 C and also in oxygen ambient at different temperatures. A shallow donor with a thermal activation enthalpy of 27meV was observed in the as-received samples by capacitance-temperature, CT scans. After annealing the samples, an increase in the shallow donor concentrations was observed. For the annealed samples, E27 could not be detected and a new shallow donor with a thermal activation enthalpy of 35meV was detected. For samples annealed above 650 C, an increase in acceptor concentration was observed which affected the low temperature capacitance. Deep level transient spectroscopy revealed the presence of five deep level defects, E1, E2, E3, E4, and E5 in the as-received samples. Annealing of the samples at 650 C removes the E4 and E5 deep level defects, while E2 also anneals-out at temperatures above 800 C. After annealing at 700 C, the T2 deep level defect was observed in all other ambient conditions except in Ar. The emission properties of the E3 deep level defect are observed to change with increase in annealing temperature beyond 800 C. For samples annealed beyond 800 C, a decrease in activation enthalpy with increase in annealing temperature has been observed which suggests an enhanced thermal ionization rate of E3 with annealing. en
dc.description.librarian am2013 en
dc.description.librarian ai2013 en
dc.description.sponsorship The authors wish to thank the University of Pretoria for the financial support. Matthias Schmidt was funded by the Postdoctoral Fellowship Program of the University of Pretoria. This work is based upon research supported by the National Research Foundation (NRF). Any opinion, findings and conclusions or recommendations expressed in this material are those of the author(s) and therefore the NRF does not accept any liability in regard thereto. The Laplace DLTS software and hardware used in the research was kindly provided by A. R. Peaker (Centre for electronic Materials Devices and Nanostructures, University of Manchester) and L. Dobaczewski (Institute of Physics, Polish Academy of Sciences). en
dc.description.uri http://jap.aip.org/ en
dc.identifier.citation Mtandgi, W, Schmidt, M, Auret, FD, Meyer, WE, Janse van Rensburg, PJ, Diale, M, Nel, JM, Das, AGM, Ling, FCC & Chawanda, A 2013, 'A study of the T2 defect and the emission properties of the E3 deep level in annealed melt grown ZnO single crystals', Journal of Applied Physics, vol. 113, pp. 124502-1-8. en
dc.identifier.issn 0021-8979 (print)
dc.identifier.issn 1089-7550 (online)
dc.identifier.other 10.1063/1.4796139
dc.identifier.uri http://hdl.handle.net/2263/21597
dc.language.iso en en
dc.publisher American Institute of Physics en
dc.rights © 2013 American Institute of Physics en
dc.subject T2 defect en
dc.subject Melt-grown single crystal ZnO en
dc.subject.lcsh Thermochemistry en
dc.subject.lcsh Annealing of crystals en
dc.subject.lcsh Zinc oxide en
dc.subject.lcsh Zinc crystals en
dc.title A study of the T2 defect and the emission properties of the E3 deep level in annealed melt grown ZnO single crystals en
dc.type Article en


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