Investigation of the diffusion behaviour of aliminium in different semiconductors

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dc.contributor.advisor Friedland, Erich Karl Helmuth en
dc.contributor.postgraduate Hauser, Thilo Michael en
dc.date.accessioned 2013-09-07T17:55:14Z
dc.date.available 2006-12-04 en
dc.date.available 2013-09-07T17:55:14Z
dc.date.created 1999-12-01 en
dc.date.issued 2006-12-04 en
dc.date.submitted 2006-12-04 en
dc.description Thesis (PhD (Physics))--University of Pretoria, 2006. en
dc.description.abstract Please read the abstract in the section 00front of this document en
dc.description.availability unrestricted en
dc.description.department Physics en
dc.identifier.citation Hauser TM, 1999, Investigation of the diffusion behaviour of aluminium in different semiconductors, PhD thesis, University of Pretoria, Pretoria, viewed yymmdd < http://hdl.handle.net/2263/30090 > en
dc.identifier.other H573/th en
dc.identifier.upetdurl http://upetd.up.ac.za/thesis/available/etd-12042006-134717/ en
dc.identifier.uri http://hdl.handle.net/2263/30090
dc.language.iso en
dc.publisher University of Pretoria en_ZA
dc.rights © 1999 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria. en
dc.subject Electronic circuits en
dc.subject Aluminum en
dc.subject Semiconductors diffusion en
dc.subject UCTD en_US
dc.title Investigation of the diffusion behaviour of aliminium in different semiconductors en
dc.type Thesis en


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