The migration behaviour of strontium co-implanted with helium into SiC at room temperature and annealed at temperatures above 1000 °C

dc.contributor.authorHlatshwayo, Thulani Thokozani
dc.contributor.authorMokgadi, Thapelo Freddy
dc.contributor.authorSohatsky, A.
dc.contributor.authorAbdalla, Zaki Adam Yousif
dc.contributor.authorSkuratov, Vladimir Alexeevich
dc.contributor.authorNjoroge, Eric Gitau
dc.contributor.authorMlambo, M.
dc.contributor.emailthulani.hlatshwayo@up.ac.zaen_US
dc.date.accessioned2024-12-09T12:16:56Z
dc.date.available2024-12-09T12:16:56Z
dc.date.issued2024-12
dc.descriptionDATA AVAILABILITY : Data will be made available on request.en_US
dc.description.abstractThe study investigated the migration behaviour of Sr implanted into SiC in the presence of helium (He). Sr ions were implanted into polycrystalline SiC samples (Sr-SiC) at room temperature (RT), and co-implanted with He ions also at RT (Sr + He-SiC). The samples were then annealed isochronally at 1100 ◦C, 1200 ◦C, and 1300 ◦C for 5 h. Transmission electron microscopy (TEM) and Rutherford backscattering spectrometry (RBS) were used to characterize both as-implanted and annealed annealed samples. Sr implantation induced amorphization of SiC, while co-implantation with He led to the formation of He nano-bubbles within the amorphous SiC matrix. During annealing, Sr migrated towards the surface, resulting in loss of Sr, cavity formation, and formation of Sr precipitates in the Sr-SiC samples. In Sr + He-SiC samples, He-induced cavities formed around the projected range of Sr, inhibiting epitaxial regrowth of SiC. As a result, the Sr distribution became concentrated around these He cavities, with Sr trapped both in front and behind them. The enhanced migration of Sr in annealed Sr + He-SiC is attributed to the slower recrystallization of the damaged SiC layer, the presence of larger He-induced cavities, and increased surface roughness. These findings provide insights into Sr migration the mechanisms in SiC, relevant for enhancing the safety of nuclear fuels.en_US
dc.description.departmentPhysicsen_US
dc.description.librarianam2024en_US
dc.description.sdgNoneen_US
dc.description.sponsorshipThe National Research Foundation of South Africa, and the Ministry of Science and Higher Education of the Russian Federation.en_US
dc.description.urihttp://www.elsevier.com/locate/vacuumen_US
dc.identifier.citationHlatswayo, T.T., Mokgadi, T.F., Sohatsky, A. et al. 2024, 'The migration behaviour of strontium co-implanted with helium into SiC at room temperature and annealed at temperatures above 1000 °C', Vacuum, vol. 230, art. 113676, pp. 1-9. https://DOI.org/10.1016/j.vacuum.2024.113676.en_US
dc.identifier.issn0042-207X (print)
dc.identifier.issn1879-2715 (online)
dc.identifier.other10.1016/j.vacuum.2024.113676
dc.identifier.urihttp://hdl.handle.net/2263/99811
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.rights© 2024 The Authors. This is an open access article under the CC BY-NC-ND license.en_US
dc.subjectSr precipitatesen_US
dc.subjectCavitiesen_US
dc.subjectAnnealingen_US
dc.subjectHeliumen_US
dc.subjectEpitaxial regrowthen_US
dc.subjectSilicon carbide (SiC)en_US
dc.subjectRutherford backscattering spectrometry (RBS)en_US
dc.subjectTransmission electron microscopy (TEM)en_US
dc.titleThe migration behaviour of strontium co-implanted with helium into SiC at room temperature and annealed at temperatures above 1000 °Cen_US
dc.typeArticleen_US

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