Ar plasma induced deep levels in epitaxial n-GaAs

dc.contributor.authorVenter, Andre
dc.contributor.authorNyamhere, Cloud
dc.contributor.authorBotha, J.R.
dc.contributor.authorAuret, Francois Danie
dc.contributor.authorJanse van Rensburg, J.P.
dc.contributor.authorMeyer, Walter Ernst
dc.contributor.authorCoelho, Sergio M.M.
dc.contributor.authorKolkovsky, V.I.
dc.date.accessioned2012-03-13T06:13:08Z
dc.date.available2012-03-13T06:13:08Z
dc.date.issued2012-03-08
dc.description.abstractAr plasma etching of n-type (Si doped) GaAs introduces several electron traps (Ec - 0.04 eV, Ec - 0.07 eV, Ec - 0.19 eV, Ec - 0.31 eV, Ec - 0.53 eV, and Ec - 0.61 eV). The trap, Ec - 0.04 eV, labelled E10 and having a trap signature similar to irradiation induced defect E1, appears to be metastable. Ec - 0.31 eV and Ec - 0.61 eV are metastable too and they are similar to the M3/M4 defect configuration present in hydrogen plasma exposed n-GaAs.en
dc.description.librariannf2012en
dc.description.sponsorshipSouth African National Research Foundationen_US
dc.description.urihttp://jap.aip.org/en_US
dc.identifier.citationVenter, A, Nyamhere, C, Botha, JR, Auret, FD, Van Rensburg, PJJ, Meyer, WE, Coelho, SMM & Kolkovsky, VI 2012, 'Ar plasma induced deep levels in epitaxial n-GaAs', Journal of Applied Physics, vol. 111, no. 013703, pp. 1-4.en
dc.identifier.issn0021-8979 (print)
dc.identifier.issn1089-7550 (online)
dc.identifier.other10.1063/1.3673322
dc.identifier.urihttp://hdl.handle.net/2263/18424
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rights© 2012 American Institute of Physicsen
dc.subjectAr plasma etchingen
dc.subjectEpitaxial n-GaAsen
dc.subjectLow energy ICP etchingen
dc.subject.lcshPlasma etchingen
dc.subject.lcshEpitaxyen
dc.titleAr plasma induced deep levels in epitaxial n-GaAsen
dc.typeArticleen

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