Electrical characterization of electron irradiated and annealed lowly-doped 4H-SiC

dc.contributor.authorOmotoso, Ezekiel
dc.contributor.authorParadzah, Alexander Tapera
dc.contributor.authorLegodi, Matshisa Johannes
dc.contributor.authorDiale, M. (Mmantsae Moche)
dc.contributor.authorMeyer, Walter Ernst
dc.contributor.authorAuret, Francois Danie
dc.contributor.emailezekiel.omotoso@up.ac.zaen_ZA
dc.date.accessioned2017-11-10T09:29:59Z
dc.date.issued2017-10
dc.description.abstractPlease read abstract in the article.en_ZA
dc.description.departmentPhysicsen_ZA
dc.description.embargo2018-10-15
dc.description.librarianhj2017en_ZA
dc.description.sponsorshipThe University of Pretoria; Postdoctoral Fellowship Program of the University of Pretoria and the National Research Foundation (NRF) of South Africa.en_ZA
dc.description.urihttp://www.elsevier.com/locate/nimben_ZA
dc.identifier.citationOmotoso, E., Paradzah, A.T., Legodi, M.J., Diale, M., Meyer, W.E. & Auret, F.D. 2017, 'Electrical characterization of electron irradiated and annealed lowly - doped 4H-SiC', Nuclear Instruments and Methods in Physics Research Section B : Beam Interactions with Materials and Atoms, vol. 409, pp. 41-45.en_ZA
dc.identifier.issn0168-583X (print)
dc.identifier.issn1872-9584 (online)
dc.identifier.other10.1016/j.nimb.2017.05.042
dc.identifier.urihttp://hdl.handle.net/2263/63094
dc.language.isoenen_ZA
dc.publisherElsevieren_ZA
dc.rights© 2017 Elsevier B.V. All rights reserved. Notice : this is the author’s version of a work that was accepted for publication in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. A definitive version was subsequently published in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, vol. 409, pp. 41-45, 2017. doi : 10.1016/j.nimb.2017.05.042.en_ZA
dc.subjectHigh energy electron (HEE)en_ZA
dc.subjectIrradiationen_ZA
dc.subject4H-SiCen_ZA
dc.subjectSchottky contactsen_ZA
dc.subjectDeep level transient spectroscopy (DLTS)en_ZA
dc.subjectSpectroscopyen_ZA
dc.subjectDetectorsen_ZA
dc.subjectDefectsen_ZA
dc.subjectSchottky diodesen_ZA
dc.subjectDeep levelsen_ZA
dc.subjectBand gap statesen_ZA
dc.subject4H–silicon carbideen_ZA
dc.subjectAlpha-particle irradiationen_ZA
dc.titleElectrical characterization of electron irradiated and annealed lowly-doped 4H-SiCen_ZA
dc.typePostprint Articleen_ZA

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