Structural and electrical properties of Mg-doped vanadium dioxide thin films via room-temperature ion implantation

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Authors

Mabakachaba, B.M.
Madiba, I.G.
Kennedy, J.
Kaviyarasu, K.
Ngoupe, P.
Khanyile, B.S.
Janse van Rensburg, Johan
Ezema, F.
Arendse, C.J.
Maaza, M.

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Elsevier

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Keywords

Mg-implated, Vanadium dioxide, Ion implantation, Fluence, Transition phase, Electrical properties, Thin flim, SIMNRA, Rutherford backscattering spectroscopy (RBS)

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Citation

Mabakachaba, B.M., Madiba, I.G., Kennedy, J. et al. 2020, 'Structural and electrical properties of Mg-doped vanadium dioxide thin films via room-temperature ion implantation', Surfaces and Interfaces, vol. 20, art. 100590, pp. 1-6.