Effek van die skermgas-samestelling in ’n indukIefgekoppelde plasma : ʼn eindige-elementanalis

Show simple item record

dc.contributor.author Grobler, N.J.M. (Nicolas)
dc.contributor.author Bissett, H.
dc.contributor.author Puts, Gerard Jacob
dc.contributor.author Crouse, Philippus L.
dc.date.accessioned 2021-11-04T08:10:09Z
dc.date.available 2021-11-04T08:10:09Z
dc.date.issued 2020-11-11
dc.description.abstract Die skermgas speel ’n belangrike rol in die termiese beskerming van die reaktorwand in ’n induktiefgekoppelde plasmareaktor (IGP). Waterstof ioniseer moeiliker as argon. Waterstof word dus in klein hoeveelhede in die skermgas gebruik waar argon die hoof-plasmagas is om plasmavorming in die omgewing van die wand te verhoed. Die hoë vloeisnelheid van die skermgas verminder ook die tyd vir hitte-oordrag na die wand. Daar is verskeie numeriese modelle van IGP-sisteme in die literatuur; nie een neem die effek van die skermgassamestelling in ag nie. Die hoeveelheid waterstof in die skermgas en sy hoër ionisasiepotensiaal kan groot newe-effekte op die plasmagedrag hê. ’n Oormaat waterstof in die skermgas is ook ’n vermorsing . Beide faktore het ’n invloed op die ekonomie van die plasmaproses. Hierdie navorsing wys dat meer as 2 % H2 in die skermgas benodig word om plasmavorming teen die wand te voorkom. ’n Lokale minimum in stralingsverliese dui daarop dat die optimale skermgassamestelling vir hierdie sisteem 3 % H2 in die argonskermgas is. Die kommersiële eindige-elementgebaseerde sagtewarepakket COMSOL Multiphysics is vir hierdie werk gebruik. en_ZA
dc.description.abstract Sheath gas has a crital role in the thermal protection of the inner reactor wall of an inductively-coupled plasma reactor (ICP). Argon ionises more readily than hydrogen. Hydrogen is thus used in small concentrations in the sheath gas when argon is the main plasma gas in order to prevent plama formation in close proximity to the reactor wall. The high linear velocity of the sheath gas further minimises temperature increase of the sheath gas, and thus heat transfer to the reactor wall. Many numerical models of ICPs have been published in the literature; not one has specifi cally taken the effect of sheath gas into account. The concentration of hydrogen may have deleterious effects on general plasma behaviour, because of its higher ionisation potential. In addition, an excess of hydrogen is costly. Both factors have an infl uence on the economics of any plasma process. The research reported here shows that more than 2 % H2 in the sheath gas is required to prevent plasma formation at the wall surface. A local minimimum in modelled radiative heat losses indicates the optimal hydrogen concentration to be 3 %. The commercial software package COMSOL Multiphysics was used for this work. en_ZA
dc.description.department Chemistry en_ZA
dc.description.librarian am2021 en_ZA
dc.description.uri http://www.satnt.ac.za en_ZA
dc.identifier.citation NJM Grobler, H Bissett , GJ Puts, PL Crouse, Die effek van die skermgassamestelling in ’n induk-tiefgekoppelde plasma: ʼn Eindige-elementanalise, Suid-Afrikaanse Tydskrif vir Natuurwetenskap en Tegnologie 39(1) (2020). https://DOI.org/ 10.36303/ SATNT.2020.39.1.799 en_ZA
dc.identifier.issn 0254-3486 (print)
dc.identifier.issn 2222-4173 (online)
dc.identifier.other 10.36303/ SATNT.2020.39.1.799
dc.identifier.uri http://hdl.handle.net/2263/82555
dc.language.iso en en_ZA
dc.publisher AOSIS Open Journals en_ZA
dc.rights © 2020. Authors. Licensee: Die Suid- Afrikaanse Akademie vir Wetenskap en Kuns. Hierdie werk is onder die Creative Commons Attribution License gelisensieer. en_ZA
dc.subject Eindige-elementanalise en_ZA
dc.subject Induktiefgekoppelde plasmareaktor (IGP) en_ZA
dc.subject Skermgas en_ZA
dc.subject Finite element analysis en_ZA
dc.subject Inductively-coupled plasma reactor (ICP) en_ZA
dc.subject Sheath gas en_ZA
dc.title Effek van die skermgas-samestelling in ’n indukIefgekoppelde plasma : ʼn eindige-elementanalis en_ZA
dc.title.alternative The effect of sheat-gas composition in an inductively-coupled plasma reactor : a finite element analysis en_ZA
dc.type Article en_ZA


Files in this item

This item appears in the following Collection(s)

Show simple item record