Investigating the effect of heat treatment on the diffusion behaviour of xenon implanted in glassy carbon

Show simple item record

dc.contributor.author Ismail, M.Y.A. (Mahjoub)
dc.contributor.author Malherbe, Johan B.
dc.contributor.author Odutemowo, Opeyemi Shakirah
dc.contributor.author Njoroge, E.G. (Eric)
dc.contributor.author Hlatshwayo, Thulani Thokozani
dc.contributor.author Mlambo, Mbuso
dc.contributor.author Wendler, Elke
dc.date.accessioned 2019-03-08T09:10:25Z
dc.date.available 2019-03-08T09:10:25Z
dc.date.issued 2018-03
dc.description.abstract The effect of sequential isochronal annealing on the diffusion behavior of implanted xenon in glassy carbon is reported. Glassy carbon substrates were implanted with 200 keV xenon ions to a fluence of 1 × 1016Xe+cm−2. The sample was annealed in vacuum at temperatures ranging from 300 °C to 1000 °C for 5 h in steps of 100 °C. The RBS depth profiles obtained at temperatures above 800 °C showed that some diffusion occurred. The broadening of the peaks was not accompanied with a loss of the implanted Xe. Microstructural changes in the glassy carbon substrate due to Xe bombardment and annealing were monitored using Raman spectroscopy. The Raman spectrum obtained after xenon bombardment showed that the glassy carbon substrate became amorphized. However, a slight recovery of the glassy carbon structure was noticed after heat treatment. The SEM micrographs of the glassy carbon substrate showed an increase in the surface roughness of the glassy carbon substrate after implantation. The increase in the roughness of the glassy carbon substrate was attributed to the sputtering of the loosely bonded carbon atoms along the polishing marks after implantation and annealing. en_ZA
dc.description.department Physics en_ZA
dc.description.librarian hj2019 en_ZA
dc.description.sponsorship MYA Ismail, acknowledges the financial support by the University of Pretoria (South Africa) in terms of the UP postgraduate bursary and by the Ministry of Higher Education, the University of Zalingei (Sudan). en_ZA
dc.description.uri http://www.journals.elsevier.com/vacuum en_ZA
dc.identifier.citation Ismail, M.Y.A., Malherbe, J.B., Odutemowo, O.S. et al. 2018, 'Investigating the effect of heat treatment on the diffusion behaviour of xenon implanted in glassy carbon', Vacuum, vol. 149, pp. 74-88. en_ZA
dc.identifier.issn 0042-207X (print)
dc.identifier.issn 1879-2715 (online)
dc.identifier.other 10.1016/j.vacuum.2017.12.021
dc.identifier.uri http://hdl.handle.net/2263/68616
dc.language.iso en en_ZA
dc.publisher Elsevier en_ZA
dc.rights © 2017 Elsevier Ltd. All rights reserved. Notice : this is the author’s version of a work that was accepted for publication in Vacuum. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. A definitive version was subsequently published in Vacuum, vol. 149, pp. 74-78. 2018. doi : 10.1016/j.vacuum.2017.12.021. en_ZA
dc.subject Glass en_ZA
dc.subject SEM micrographs en_ZA
dc.subject Microstructural changes en_ZA
dc.subject Isochronal annealing en_ZA
dc.subject Diffusion behavior en_ZA
dc.subject Carbon substrates en_ZA
dc.subject Carbon structures en_ZA
dc.subject After-heat treatment en_ZA
dc.subject Surface roughness en_ZA
dc.subject Substrates en_ZA
dc.subject Scanning electron microscopy (SEM) en_ZA
dc.subject Rubidium en_ZA
dc.subject Raman spectroscopy en_ZA
dc.subject Heat treatment en_ZA
dc.subject Glassy carbon en_ZA
dc.subject Diffusion en_ZA
dc.subject Annealing en_ZA
dc.subject Rutherford backscattering spectroscopy (RBS) en_ZA
dc.title Investigating the effect of heat treatment on the diffusion behaviour of xenon implanted in glassy carbon en_ZA
dc.type Postprint Article en_ZA


Files in this item

This item appears in the following Collection(s)

Show simple item record