Investigating the effect of heat treatment on the diffusion behaviour of xenon implanted in glassy carbon

dc.contributor.authorIsmail, Mahjoub Yagoub Abdalla
dc.contributor.authorMalherbe, Johan B.
dc.contributor.authorOdutemowo, Opeyemi Shakirah
dc.contributor.authorNjoroge, Eric Gitau
dc.contributor.authorHlatshwayo, Thulani Thokozani
dc.contributor.authorMlambo, Mbuso
dc.contributor.authorWendler, Elke
dc.contributor.emailu16306873@tuks.co.zaen_ZA
dc.date.accessioned2019-03-08T09:10:25Z
dc.date.available2019-03-08T09:10:25Z
dc.date.issued2018-03
dc.description.abstractThe effect of sequential isochronal annealing on the diffusion behavior of implanted xenon in glassy carbon is reported. Glassy carbon substrates were implanted with 200 keV xenon ions to a fluence of 1 × 1016Xe+cm−2. The sample was annealed in vacuum at temperatures ranging from 300 °C to 1000 °C for 5 h in steps of 100 °C. The RBS depth profiles obtained at temperatures above 800 °C showed that some diffusion occurred. The broadening of the peaks was not accompanied with a loss of the implanted Xe. Microstructural changes in the glassy carbon substrate due to Xe bombardment and annealing were monitored using Raman spectroscopy. The Raman spectrum obtained after xenon bombardment showed that the glassy carbon substrate became amorphized. However, a slight recovery of the glassy carbon structure was noticed after heat treatment. The SEM micrographs of the glassy carbon substrate showed an increase in the surface roughness of the glassy carbon substrate after implantation. The increase in the roughness of the glassy carbon substrate was attributed to the sputtering of the loosely bonded carbon atoms along the polishing marks after implantation and annealing.en_ZA
dc.description.departmentPhysicsen_ZA
dc.description.librarianhj2019en_ZA
dc.description.sponsorshipMYA Ismail, acknowledges the financial support by the University of Pretoria (South Africa) in terms of the UP postgraduate bursary and by the Ministry of Higher Education, the University of Zalingei (Sudan).en_ZA
dc.description.urihttp://www.journals.elsevier.com/vacuumen_ZA
dc.identifier.citationIsmail, M.Y.A., Malherbe, J.B., Odutemowo, O.S. et al. 2018, 'Investigating the effect of heat treatment on the diffusion behaviour of xenon implanted in glassy carbon', Vacuum, vol. 149, pp. 74-88.en_ZA
dc.identifier.issn0042-207X (print)
dc.identifier.issn1879-2715 (online)
dc.identifier.other10.1016/j.vacuum.2017.12.021
dc.identifier.urihttp://hdl.handle.net/2263/68616
dc.language.isoenen_ZA
dc.publisherElsevieren_ZA
dc.rights© 2017 Elsevier Ltd. All rights reserved. Notice : this is the author’s version of a work that was accepted for publication in Vacuum. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. A definitive version was subsequently published in Vacuum, vol. 149, pp. 74-78. 2018. doi : 10.1016/j.vacuum.2017.12.021.en_ZA
dc.subjectGlassen_ZA
dc.subjectSEM micrographsen_ZA
dc.subjectMicrostructural changesen_ZA
dc.subjectIsochronal annealingen_ZA
dc.subjectDiffusion behavioren_ZA
dc.subjectCarbon substratesen_ZA
dc.subjectCarbon structuresen_ZA
dc.subjectAfter-heat treatmenten_ZA
dc.subjectSurface roughnessen_ZA
dc.subjectSubstratesen_ZA
dc.subjectScanning electron microscopy (SEM)en_ZA
dc.subjectRubidiumen_ZA
dc.subjectRaman spectroscopyen_ZA
dc.subjectHeat treatmenten_ZA
dc.subjectGlassy carbonen_ZA
dc.subjectDiffusionen_ZA
dc.subjectAnnealingen_ZA
dc.subjectRutherford backscattering spectroscopy (RBS)en_ZA
dc.titleInvestigating the effect of heat treatment on the diffusion behaviour of xenon implanted in glassy carbonen_ZA
dc.typePostprint Articleen_ZA

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