Ramezani, A.H.Hoseinzadeh, SiamakEbrahiminejad, Zh.2020-11-252020-03Ramezani, A.H., Hoseinzadeh, S. & Ebrahiminejad, Zh. 2020, 'Structural and mechanical properties of tantalum thin films ected by nitrogen ion implantation', Modern Physics Letters B, vol. 34, no. 15, art. 2050163.0217-9849 (print)1793-6640 (online)10.1142/S0217984920501638http://hdl.handle.net/2263/77180Please read abstract in the article.en© 2020 World Scientific Publishing Co. Electronic version of an article published as Modern Physics Letters B, vol. 34, no. 15, art. 2050163, 2020. doi : 10.1142/S0217984920501638. The original publication is available at : http://www.worldscinet.commplb.Ion implantationX-ray diffraction (XRD)TantalumAtomic force microscopy (AFM)Friction coefficientMicrohardnessScanning electron microscopy (SEM)Engineering, built environment and information technology articles SDG-03SDG-03: Good health and well-beingEngineering, built environment and information technology articles SDG-04SDG-04: Quality educationEngineering, built environment and information technology articles SDG-09SDG-09: Industry, innovation and infrastructureEngineering, built environment and information technology articles SDG-12SDG-12: Responsible consumption and productionEngineering, built environment and information technology articles SDG-13SDG-13: Climate actionPostprint Article