Kyesmen, Pannan IsaNombona, NolwaziDiale, M. (Mmantsae Moche)2021-01-152020-11Kyesmen, P.I., Nombona, N. & Diale, M. 2020, 'Modified annealing approach for preparing multi-layered hematite thin films for photoelectrochemical water splitting', Materials Research Bulletin, vol. 131, art. 110964, pp. 1-8.0025-5408 (print)1873-4227 (online)10.1016/j.materresbull.2020.110964http://hdl.handle.net/2263/78046Please read abstract in the article.en© 2020 Elsevier Ltd. All rights reserved. Notice : this is the author’s version of a work that was accepted for publication in Materials Research Bulletin. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. A definitive version was subsequently published in Materials Research Bulletin, vol. 131, art. 110964, pp. 1-8, 2020. doi : 10.1016/j.materresbull.2020.110964.Photoelectrochemical (PEC)Reversible hydrogen electrode (RHE)HematiteMulti-layered filmsDip coatingAnnealing temperaturePhotoelectrochemical performanceModified annealing approach for preparing multi-layered hematite thin films for photoelectrochemical water splittingPostprint Article