Ramezani, A.H.Hoseinzadeh, SiamakEbrahiminejad, Zh.2020-12-022020-06Ramezani, A.H., Hoseinzadeh, S. & Ebrahiminejad, Z. Statistical and fractal analysis of nitrogen ion implanted tantalum thin films. Applied Physics A 126, 481 (2020). https://doi.org/10.1007/s00339-020-03671-7.0947-8396 (print)1432-0630 (online)10.1007/s00339-020-03671-7http://hdl.handle.net/2263/77242Please read abstract in the article.en© Springer-Verlag GmbH Germany, part of Springer Nature 2020. The original publication is available at : https://link.springer.com/journal/339.Tantalum bulkNitrogen ion implantationMonofractal analysisFractal dimensionEngineering, built environment and information technology articles SDG-04SDG-04: Quality educationEngineering, built environment and information technology articles SDG-07SDG-07: Affordable and clean energyEngineering, built environment and information technology articles SDG-09SDG-09: Industry, innovation and infrastructureEngineering, built environment and information technology articles SDG-12SDG-12: Responsible consumption and productionPostprint Article