Room temperature and high-pressure-pulsed laser deposition of nanocrystalline VO2 thin films on glass substrate : plasma and film analyses

Lafane, SlimaneMalek, SmailNel, Jacqueline MargotAbdelli-Messaci, Samira2022-03-282022-03-282021-01Lafane, S., Malek, S., Nel, J. et al. Room temperature and high-pressure-pulsed laser deposition of nanocrystalline VO2 thin films on glass substrate: plasma and film analyses. Applied Physics A 127, 75 (2021). https://doi.org/10.1007/s00339-020-04174-1.0947-8396 (print)1432-0630 (online)10.1007/s00339-020-04174-1http://hdl.handle.net/2263/84673Please read abstract in the article.en© 2021, The Author(s), under exclusive licence to Springer-Verlag GmbH, DE part of Springer Nature. The original publication is available at : https://link.springer.com/journal/339.Pulsed laser depositionNanocrystalline vanadium dioxideRoom temperatureHigh oxygen pressurePlasma diagnosticsRoom temperature and high-pressure-pulsed laser deposition of nanocrystalline VO2 thin films on glass substrate : plasma and film analysesPostprint Article