Heavy metal tolerance of Aspergillus piperis using the agar well diffusion method
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Date
Authors
De Wet, Maria Martha Marthina
Horstmann, Carla
Brink, Hendrik Gideon
Journal Title
Journal ISSN
Volume Title
Publisher
Italian Association of Chemical Engineering
Abstract
A lead resistant strain of Aspergillus piperis, a subgroup of A. niger with known heavy metal remediation
properties, was tested for heavy metal resistance. The agar well diffusion method was used with metal
solutions containing 2000 ppm of copper (Cu(II)), iron (Fe(II)), lead (Pb(II)), magnesium (Mg(II)),
manganese (Mn(VI)), selenium (Se(VI)), cadmium (Cd(II)), and zinc (Zn(II)) ions, respectively. Of the metals
tested, A. piperis only exhibited substantial growth inhibition in Cd(II) up to 23 mm from the well center, while
simultaneously completely inhibiting spore formation. Lesser inhibition was observed in Se(IV), Pb(II), and
Zn(II) of which the latter two exhibited evidence that additional metal resistance was developed during
incubation. After five days the fungus had successfully grown in the presence of all the other metals, making
A. piperis a promising candidate for heavy metal mycoremediation research.
Description
Keywords
Aspergillus piperis, Bioremediation, Agar well diffusion method, Metal tolerance, Lead remediation
Sustainable Development Goals
Citation
De Wet M., Horstmann C., Brink H., 2020, Heavy Metal Tolerance of Aspergillus Piperis Using the Agar Well
Diffusion Method, Chemical Engineering Transactions, 79, 343-348, DOI:10.3303/CET2079058.