Treatment of TRISO-coated particles with CF4 in a low temperature plasma
| dc.contributor.author | Van der Walt, Izak Jacobus | |
| dc.contributor.author | Nel, Johannes T. | |
| dc.contributor.author | Crouse, Philippus L. | |
| dc.contributor.author | Jansen, Arnold Alexander | |
| dc.contributor.author | Kekana, Sipho J. | |
| dc.date.accessioned | 2012-05-25T08:06:49Z | |
| dc.date.available | 2012-05-25T08:06:49Z | |
| dc.date.issued | 2011-06 | |
| dc.description.abstract | An alternative recovery method to the mechanical crushing of off-specification tri-structural-isotropic (TRISO) coated fuel microspheres is demonstrated. It is shown that the inert SiC layer can be completely removed by etching with the active fluorine species from an inductively coupled radio-frequency CF4 glow-discharge impinging a static bed from the top, at a working pressure of 1 kPa. At this pressure mass transport does not have a rate limiting role and the chemical reaction itself is rate determining. A treatment time of roughly 4 h is required for the conditions reported here | en_US |
| dc.description.librarian | ai2012 | en |
| dc.description.sponsorship | The South African National Research Foundation | en_US |
| dc.description.uri | http://www.elsevier.com/locate/jnucmat | en_US |
| dc.identifier.citation | Izak J. van der Walt, Johannes T. Nel, Philippus L. Crouse, Arnold A. Jansen, Sipho J. Kekana, The treatment of TRISO-coated particles with CF4 in a low temperature plasma', Journal of Nuclear Materials, vol. 413, no. 3, pp. 156-161, (2011), doi: 10.1016/j.jnucmat.2011.04.017 | en_US |
| dc.identifier.issn | 0022-3115 (print) | |
| dc.identifier.issn | 1873-4820 (online) | |
| dc.identifier.other | 10.1016/j.jnucmat.2011.04.017 | |
| dc.identifier.uri | http://hdl.handle.net/2263/18893 | |
| dc.language.iso | en | en_US |
| dc.publisher | Elsevier | en_US |
| dc.rights | © 2011 Elsevier B.V. All rights reserved. | en_US |
| dc.subject | TRISO (tri-structural-isotropic) | en_US |
| dc.subject.lcsh | Silicon carbide -- Microstructure | en |
| dc.subject.lcsh | Silicon carbide -- Dissolution | en |
| dc.subject.lcsh | Particles (Nuclear physics) | en |
| dc.subject.lcsh | Dissolution (Chemistry) | en |
| dc.subject.lcsh | Etching | en |
| dc.subject.lcsh | Radioactive wastes | en |
| dc.subject.lcsh | Plasma chemistry | en |
| dc.title | Treatment of TRISO-coated particles with CF4 in a low temperature plasma | en_US |
| dc.type | Postprint Article | en_US |