Migration behaviour of selenium implanted into polycrystalline 3C–SiC

dc.contributor.authorAbdalla, Zaki Adam Yousif
dc.contributor.authorIsmail, Mahjoub Yagoub Abdalla
dc.contributor.authorNjoroge, Eric Gitau
dc.contributor.authorHlatshwayo, Thulani Thokozani
dc.contributor.authorWendler Elke
dc.contributor.authorMalherbe, Johan B.
dc.contributor.emailu17208620@tuks.co.zaen_ZA
dc.date.accessioned2020-04-02T08:06:54Z
dc.date.issued2020-05
dc.description.abstractPlease read abstract in the article.en_ZA
dc.description.departmentPhysicsen_ZA
dc.description.embargo2021-05-01
dc.description.librarianhj2020en_ZA
dc.description.sponsorshipThe National Research Foundation and The World Academy of Science.en_ZA
dc.description.urihttp://www.journals.elsevier.com/vacuumen_ZA
dc.identifier.citationAbdalla, Z.A.Y., Ismail, M.Y.A., Njoroge, E.G. et al. 2020, 'Migration behaviour of selenium implanted into polycrystalline 3C–SiC', Vacuum, vol. 175, art. 109235, pp. 1-6.en_ZA
dc.identifier.issn0042-207X (print)
dc.identifier.issn1879-2715 (online)
dc.identifier.other10.1016/j.vacuum.2020.109235
dc.identifier.urihttp://hdl.handle.net/2263/73909
dc.language.isoenen_ZA
dc.publisherElsevieren_ZA
dc.rights© 2020 Elsevier Ltd. All rights reserved. Notice : this is the author’s version of a work that was accepted for publication in Vacuum. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. A definitive version was subsequently published in Vacuum, vol. 175, art. 109235, pp. 1-6, 2020. doi : 10.1016/j.vacuum.2020.109235.en_ZA
dc.subjectDiffusionen_ZA
dc.subjectPolycrystallineen_ZA
dc.subjectSilicon carbide (SiC)en_ZA
dc.subjectRaman spectroscopyen_ZA
dc.subjectRutherford backscattering spectrometry (RBS)en_ZA
dc.subjectScanning electron microscopy (SEM)en_ZA
dc.titleMigration behaviour of selenium implanted into polycrystalline 3C–SiCen_ZA
dc.typePostprint Articleen_ZA

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