Novel thermally reduced graphene oxide microsupercapacitor fabricated via mask free axidraw direct writing

dc.contributor.authorMaphiri, Vusani Muswa
dc.contributor.authorRutavi, Gift
dc.contributor.authorSylla, Ndeye Fatou
dc.contributor.authorAdewinbi, Saheed A.
dc.contributor.authorFasakin, Oladepo
dc.contributor.authorManyala, Ncholu I.
dc.contributor.emailncholu.manyala@up.ac.zaen_ZA
dc.date.accessioned2022-02-04T08:08:38Z
dc.date.available2022-02-04T08:08:38Z
dc.date.issued2021-07
dc.description.abstractWe demonstrate a simple method to fabricate all solid state, thermally reduced graphene oxide (TRGO) microsupercapacitors (µ-SCs) prepared using the atmospheric pressure chemical vapor deposition (APCVD) and a mask-free axiDraw sketching apparatus. The Fourier transform infrared spectroscopy (FTIR) shows the extermination of oxygen functional groups as the reducing temperature (RT) increases, while the Raman shows the presence of the defect and graphitic peaks. The electrochemical performance of the µ-SCs showed cyclic voltammetry (CV) potential window of 0–0.8 V at various scan rates of 5–1000 mVs−1 with a rectangular shape, depicting characteristics of electric double layer capacitor (EDLC) behavior. The µ-SC with 14 cm−2 (number of digits per unit area) showed a 46% increment in capacitance from that of 6 cm−2 , which is also higher than the µ-SCs with 22 and 26 cm−2 . The TRGO-500 exhibits volumetric energy and power density of 14.61 mW h cm−3 and 142.67 mW cm−3 , respectively. The electrochemical impedance spectroscopy (EIS) showed the decrease in the equivalent series resistance (ESR) as a function of RT due to reduction of the resistive functional groups present in the sample. Bode plot showed a phase angel of −85◦ for the TRGO-500 µ-SC device. The electrochemical performance of the µ-SC devices can be tuned by varying the RT, number of digits per unity area, and connection configuration (parallel or series).en_ZA
dc.description.departmentPhysicsen_ZA
dc.description.librarianpm2022en_ZA
dc.description.sponsorshipThe National Research Foundation (NRF) of South Africa, the South African Research Chairs Initiative (SARChI) of the Department of Science and Technology and the University of Pretoria.en_ZA
dc.description.urihttp://www.mdpi.com/journal/nanomaterialsen_ZA
dc.identifier.citationMaphiri, V.M.; Rutavi, G.; Sylla, N.F.; Adewinbi, S.A.; Fasakin, O.; Manyala, N. Novel Thermally Reduced Graphene Oxide Microsupercapacitor Fabricated via Mask—Free AxiDraw Direct Writing. Nanomaterials 2021, 11, 1909. https://doi.org/10.3390/nano11081909.en_ZA
dc.identifier.issn2079-4991 (online)
dc.identifier.other10.3390/nano11081909
dc.identifier.urihttp://hdl.handle.net/2263/83623
dc.language.isoenen_ZA
dc.publisherMDPIen_ZA
dc.rights© 2021 by the authors. Licensee: MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https:// creativecommons.org/licenses/by/ 4.0/).en_ZA
dc.subjectMicrosupercapacitoren_ZA
dc.subjectDirect writingen_ZA
dc.subjectEnergy storageen_ZA
dc.subjectGraphene oxideen_ZA
dc.subjectThermally reduced graphene oxide (TRGO)en_ZA
dc.subjectAtmospheric pressure chemical vapor deposition (APCVD)en_ZA
dc.subjectFourier transform infrared spectroscopy (FTIR)en_ZA
dc.subjectRaman spectroscopyen_ZA
dc.subjectEquivalent series resistance (ESR)en_ZA
dc.subjectElectrochemical impedance spectroscopy (EIS)en_ZA
dc.titleNovel thermally reduced graphene oxide microsupercapacitor fabricated via mask free axidraw direct writingen_ZA
dc.typeArticleen_ZA

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