A comparative study on the properties of ErxZn1−xO and SmxZn1−xO nanostructured thin films for electronic device applications

dc.contributor.authorNyarige, Justine Sageka
dc.contributor.authorNambala, Fred Joe
dc.contributor.authorDiale, M. (Mmantsae Moche)
dc.contributor.emailmmantsae.diale@up.ac.zaen_US
dc.date.accessioned2023-07-20T06:42:30Z
dc.date.issued2022-12
dc.descriptionDATA AVAILABILITY : Data will be made available on request.en_US
dc.description.abstractIn this study, the undoped, Erbium (Er) doped and Samarium (Sm) doped (1, 3, and 5 wt%) ZnO were synthesized using spray pyrolysis. X-ray diffraction patterns confirmed ZnO with strong diffraction peaks indexed in their right 2-theta angles. Raman spectroscopy observed A1, E1 and E2 vibrational phonon modes of wurtzite hexagonal ZnO. Scanning electron microscopy revealed nanoparticles that were well dispersed on the surface. There was agglomeration which was decreasing with an increase in the doping concentration from 1 to 5 wt% of Er and Sm. Energy-dispersive X-ray spectroscopy confirmed the main signals for Zn, O, Er, and Sm, with no other foreign elements observed. From the UV-Vis measurements, average transmittance of 74% at 550 nm was obtained for all the samples. The bandgap calculated for the thin films was decreasing from 3.31 eV for undoped ZnO to 2.96 eV and 3.11 eV for 5% Er and Sm doped samples, respectively. Schottky diodes were fabricated using aluminum (Al) and gold (Au) as the Schottky contact and palladium (Pd) as the Ohmic contact and electrical measurements performed. Both undoped and doped ZnO showed a rectifying behavior with an improvement in the rectification of up to almost 4 orders of magnitude for 5 wt% Er and Sm doped films compared to undoped ZnO which had a rectification of 2. In addition, the Schottky Barrier heights increased from 0.559 for undoped ZnO to 0.767 and 0.760 for 5 wt% Er and Sm doped, respectively. Undoped ZnO had an ideality factor of 2.49 which was decreased to 1.72 and 1.92 for Er and Sm doped ZnO devices. Also, a reduction in the leakage current and series resistance of devices was noted in undoped and doped ZnO. The fabricated devices can be used as an alternative for Schottky diode applications.en_US
dc.description.departmentPhysicsen_US
dc.description.embargo2023-09-15
dc.description.librarianhj2023en_US
dc.description.sponsorshipThe South African Research Chairs Initiative of the Department of Science and Innovation, the National Research Foundation, the University of Pretoria and the University of Zambia.en_US
dc.description.urihttps://www.elsevier.com/locate/mtcommen_US
dc.identifier.citationNyarige, J.S., Nambala, F. & Diale, M. 2022, 'A comparative study on the properties of ErxZn1−xO and SmxZn1−xO nanostructured thin films for electronic device applications', Materials Today Communications, vol. 33, art. 104441, pp. 1-9, doi : 10.1016/j.mtcomm.2022.104441.en_US
dc.identifier.issn2352-4928 (online)
dc.identifier.other10.1016/j.mtcomm.2022.104441
dc.identifier.urihttp://hdl.handle.net/2263/91554
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.rights© 2022 Elsevier Ltd. All rights reserved. Notice : this is the author’s version of a work that was accepted for publication in Materials Today Communications. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. A definitive version was subsequently published in Materials Today Communications, vol. 33, art. 104441, pp. 1-9, 2022. doi : 10.1016/j.mtcomm.2022.104441.en_US
dc.subjectZinc oxide (ZnO)en_US
dc.subjectDopingen_US
dc.subjectSamariumen_US
dc.subjectErbiumen_US
dc.subjectSchottky barrier heightsen_US
dc.titleA comparative study on the properties of ErxZn1−xO and SmxZn1−xO nanostructured thin films for electronic device applicationsen_US
dc.typePostprint Articleen_US

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