Effek van die skermgas-samestelling in ’n indukIefgekoppelde plasma : ʼn eindige-elementanalis

dc.contributor.authorGrobler, N.J.M. (Nicolas)
dc.contributor.authorBissett, H.
dc.contributor.authorPuts, Gerard Jacob
dc.contributor.authorCrouse, Philippus L.
dc.date.accessioned2021-11-04T08:10:09Z
dc.date.available2021-11-04T08:10:09Z
dc.date.issued2020-11-11
dc.description.abstractDie skermgas speel ’n belangrike rol in die termiese beskerming van die reaktorwand in ’n induktiefgekoppelde plasmareaktor (IGP). Waterstof ioniseer moeiliker as argon. Waterstof word dus in klein hoeveelhede in die skermgas gebruik waar argon die hoof-plasmagas is om plasmavorming in die omgewing van die wand te verhoed. Die hoë vloeisnelheid van die skermgas verminder ook die tyd vir hitte-oordrag na die wand. Daar is verskeie numeriese modelle van IGP-sisteme in die literatuur; nie een neem die effek van die skermgassamestelling in ag nie. Die hoeveelheid waterstof in die skermgas en sy hoër ionisasiepotensiaal kan groot newe-effekte op die plasmagedrag hê. ’n Oormaat waterstof in die skermgas is ook ’n vermorsing . Beide faktore het ’n invloed op die ekonomie van die plasmaproses. Hierdie navorsing wys dat meer as 2 % H2 in die skermgas benodig word om plasmavorming teen die wand te voorkom. ’n Lokale minimum in stralingsverliese dui daarop dat die optimale skermgassamestelling vir hierdie sisteem 3 % H2 in die argonskermgas is. Die kommersiële eindige-elementgebaseerde sagtewarepakket COMSOL Multiphysics is vir hierdie werk gebruik.en_ZA
dc.description.abstractSheath gas has a crital role in the thermal protection of the inner reactor wall of an inductively-coupled plasma reactor (ICP). Argon ionises more readily than hydrogen. Hydrogen is thus used in small concentrations in the sheath gas when argon is the main plasma gas in order to prevent plama formation in close proximity to the reactor wall. The high linear velocity of the sheath gas further minimises temperature increase of the sheath gas, and thus heat transfer to the reactor wall. Many numerical models of ICPs have been published in the literature; not one has specifi cally taken the effect of sheath gas into account. The concentration of hydrogen may have deleterious effects on general plasma behaviour, because of its higher ionisation potential. In addition, an excess of hydrogen is costly. Both factors have an infl uence on the economics of any plasma process. The research reported here shows that more than 2 % H2 in the sheath gas is required to prevent plasma formation at the wall surface. A local minimimum in modelled radiative heat losses indicates the optimal hydrogen concentration to be 3 %. The commercial software package COMSOL Multiphysics was used for this work.en_ZA
dc.description.departmentChemistryen_ZA
dc.description.librarianam2021en_ZA
dc.description.urihttp://www.satnt.ac.zaen_ZA
dc.identifier.citationNJM Grobler, H Bissett , GJ Puts, PL Crouse, Die effek van die skermgassamestelling in ’n induk-tiefgekoppelde plasma: ʼn Eindige-elementanalise, Suid-Afrikaanse Tydskrif vir Natuurwetenskap en Tegnologie 39(1) (2020). https://DOI.org/ 10.36303/ SATNT.2020.39.1.799en_ZA
dc.identifier.issn0254-3486 (print)
dc.identifier.issn2222-4173 (online)
dc.identifier.other10.36303/ SATNT.2020.39.1.799
dc.identifier.urihttp://hdl.handle.net/2263/82555
dc.language.isoenen_ZA
dc.publisherAOSIS Open Journalsen_ZA
dc.rights© 2020. Authors. Licensee: Die Suid- Afrikaanse Akademie vir Wetenskap en Kuns. Hierdie werk is onder die Creative Commons Attribution License gelisensieer.en_ZA
dc.subjectEindige-elementanaliseen_ZA
dc.subjectInduktiefgekoppelde plasmareaktor (IGP)en_ZA
dc.subjectSkermgasen_ZA
dc.subjectFinite element analysisen_ZA
dc.subjectInductively-coupled plasma reactor (ICP)en_ZA
dc.subjectSheath gasen_ZA
dc.titleEffek van die skermgas-samestelling in ’n indukIefgekoppelde plasma : ʼn eindige-elementanalisen_ZA
dc.title.alternativeThe effect of sheat-gas composition in an inductively-coupled plasma reactor : a finite element analysisen_ZA
dc.typeArticleen_ZA

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