Growth of graphene underlayers by chemical vapor deposition

dc.contributor.authorFabiane, Mopeli
dc.contributor.authorKhamlich, Saleh
dc.contributor.authorBello, Abdulhakeem
dc.contributor.authorDangbegnon, Julien K.
dc.contributor.authorMomodu, Damilola Y.
dc.contributor.authorJohnson, Alan T. Charlie
dc.contributor.authorManyala, Ncholu I.
dc.contributor.emailncholu.manyala@up.ac.zaen_US
dc.date.accessioned2014-02-04T13:40:27Z
dc.date.available2014-02-04T13:40:27Z
dc.date.issued2013-11
dc.description.abstractWe present a simple and very convincing approach to visualizing that subsequent layers of graphene grow between the existing monolayer graphene and the copper catalyst in chemical vapor deposition (CVD). Graphene samples were grown by CVD and then transferred onto glass substrates by the bubbling method in two ways, either direct-transfer (DT) to yield poly (methyl methacrylate) (PMMA)/graphene/glass or (2) inverted transfer (IT) to yield graphene/PMMA/glass. Field emission scanning electron microscopy (FE-SEM) and atomic force microscopy (AFM) were used to reveal surface features for both the DT and IT samples. The results from FE-SEM and AFM topographic analyses of the surfaces revealed the underlayer growth of subsequent layers. The subsequent layers in the IT samples are visualized as 3D structures, where the smaller graphene layers lie above the larger layers stacked in a concentric manner. The results support the formation of the so-called “inverted wedding cake” stacking in multilayer graphene growth.en
dc.description.librarianhb2014en
dc.description.librarianai2014
dc.description.sponsorshipMF thanks the Government of Lesotho, the University of Pretoria and the NRF for financial support for his study. A.T.C.J acknowledges support from the LRSM, through the U.S. National Science Foundation MRSEC, Grant No. DMR-1120901.en
dc.description.urihttp://scitation.aip.org/content/aip/journal/advaen
dc.identifier.citationFabiane, M, Khamlich, S, Bello, A, Dangbegnon, J, Momodu, D, Johnson, ATC & Manyala, N 2013, 'Growth of graphene underlayers by chemical vapor deposition', AIP Advances, vol. 3, no. 11, art. no. 112126, pp. 1-8.en
dc.identifier.issn2158-3226 (online)
dc.identifier.other10.1063/1.4834975
dc.identifier.urihttp://hdl.handle.net/2263/33296
dc.language.isoenen
dc.publisherAmerican Institute of Physicsen
dc.rights© Author(s) 2014. This work is distributed under the Creative Commons Attribution 3.0 Unported license.en
dc.subjectGraphene underlayersen
dc.subject.lcshChemical vapor depositionen
dc.subject.lcshGrapheneen
dc.titleGrowth of graphene underlayers by chemical vapor depositionen
dc.typeArticleen

Files

Original bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
Fabiane_Growth_2013.pdf
Size:
951.05 KB
Format:
Adobe Portable Document Format
Description:
Article

License bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
license.txt
Size:
1.71 KB
Format:
Item-specific license agreed upon to submission
Description: