A new double sampling X control chart for monitoring an abrupt change in the process location
dc.contributor.author | Malela-Majika, Jean-Claude | |
dc.contributor.author | Motsepa, C.M. | |
dc.contributor.author | Graham, Marien Alet | |
dc.date.accessioned | 2019-06-18T09:24:30Z | |
dc.date.issued | 2021 | |
dc.description.abstract | This paper develops a new double sampling (DS) monitoring scheme, namely, the side-sensitive DS X chart, to monitor the process mean. The operational procedure is presented first followed by the exact form of the probability of the in-control process under the normality assumption. Finally, the performance of the new scheme is investigated by minimizing the out-of-control average run-length and extra quadratic loss function. It was observed that the proposed chart presents a better overall performance than the existing DS X chart. An illustrative example is given to facilitate the design and implementation of the new chart. | en_ZA |
dc.description.department | Science, Mathematics and Technology Education | en_ZA |
dc.description.embargo | 2020-04-13 | |
dc.description.librarian | hj2019 | en_ZA |
dc.description.sponsorship | Marien Graham’s research was funded by the National Research Foundation (NRF) [reference: PR_IFR190111407337, UID: 114814]. | en_ZA |
dc.description.uri | https://www.tandfonline.com/loi/lssp20 | en_ZA |
dc.identifier.citation | J. C. Malela-Majika, C. M. Motsepa & M. A. Graham (2021): A new double sampling X control chart for monitoring an abrupt change in the process location, Communications in Statistics - Simulation and Computation, 50(3): 917-935, DOI: 10.1080/03610918.2019.1577970. NYP. | en_ZA |
dc.identifier.issn | 0361-0918 (print) | |
dc.identifier.issn | 1532-4141 (online) | |
dc.identifier.other | 10.1080/03610918.2019.1577970 | |
dc.identifier.uri | http://hdl.handle.net/2263/70226 | |
dc.language.iso | en | en_ZA |
dc.publisher | Taylor and Francis | en_ZA |
dc.rights | © 2019 Taylor & Francis Group, LLC. This is an electronic version of an article published in Communications in Statistics : Simulation and Computation, vol. 50, no. 3, pp. 917-935, 2021. doi : 10.1080/03610918.2019.1577970. Communications in Statistics : Simulation and Computation is available online at : http://www.tandfonline.comloi/lssp20. | en_ZA |
dc.subject | Double sampling (DS) | en_ZA |
dc.subject | DS control chart | en_ZA |
dc.subject | Statistical process monitoring | en_ZA |
dc.subject | Side-sensitive DS scheme | en_ZA |
dc.subject | Overall performance measures | en_ZA |
dc.subject | Run length distribution | en_ZA |
dc.title | A new double sampling X control chart for monitoring an abrupt change in the process location | en_ZA |
dc.type | Postprint Article | en_ZA |