Room temperature and high-pressure-pulsed laser deposition of nanocrystalline VO2 thin films on glass substrate : plasma and film analyses

dc.contributor.authorLafane, Slimane
dc.contributor.authorMalek, Smail
dc.contributor.authorNel, Jacqueline Margot
dc.contributor.authorAbdelli-Messaci, Samira
dc.date.accessioned2022-03-28T11:24:30Z
dc.date.available2022-03-28T11:24:30Z
dc.date.issued2021-01
dc.description.abstractPlease read abstract in the article.en_ZA
dc.description.departmentPhysicsen_ZA
dc.description.librarianhj2022en_ZA
dc.description.urihttps://link.springer.com/journal/339en_ZA
dc.identifier.citationLafane, S., Malek, S., Nel, J. et al. Room temperature and high-pressure-pulsed laser deposition of nanocrystalline VO2 thin films on glass substrate: plasma and film analyses. Applied Physics A 127, 75 (2021). https://doi.org/10.1007/s00339-020-04174-1.en_ZA
dc.identifier.issn0947-8396 (print)
dc.identifier.issn1432-0630 (online)
dc.identifier.other10.1007/s00339-020-04174-1
dc.identifier.urihttp://hdl.handle.net/2263/84673
dc.language.isoenen_ZA
dc.publisherSpringeren_ZA
dc.rights© 2021, The Author(s), under exclusive licence to Springer-Verlag GmbH, DE part of Springer Nature. The original publication is available at : https://link.springer.com/journal/339.en_ZA
dc.subjectPulsed laser depositionen_ZA
dc.subjectNanocrystalline vanadium dioxideen_ZA
dc.subjectRoom temperatureen_ZA
dc.subjectHigh oxygen pressureen_ZA
dc.subjectPlasma diagnosticsen_ZA
dc.titleRoom temperature and high-pressure-pulsed laser deposition of nanocrystalline VO2 thin films on glass substrate : plasma and film analysesen_ZA
dc.typePostprint Articleen_ZA

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