Microwave-plasma synthesis of nano-sized silicon carbide at atmospheric pressure

dc.contributor.authorVan Laar, Jean H.
dc.contributor.authorSlabber, Johan F.M.
dc.contributor.authorMeyer, Josua P.
dc.contributor.authorVan der Walt, Izak J.
dc.contributor.authorPuts, Gerard Jacob
dc.contributor.authorCrouse, Philippus L.
dc.date.accessioned2015-01-27T10:31:53Z
dc.date.available2015-01-27T10:31:53Z
dc.date.issued2015-04
dc.description.abstractA microwave plasma process operating at atmospheric pressure was developed for the synthesis of SiC nanoparticles. The process utilizes methyltrichlorosilane (MTS) as precursor, acting as both carbon and silicon source, along with an additional hydrogen feed to ensure a fully reducing reaction environment. In addition, argon served as carrier gas.. The parameters studied were the H2:MTS molar ratio and the total enthalpy, in the range 0 to 10 and 70 to 220 MJ/kg respectively. The particles size distribution ranged from 15 to 140 nm as determined by SEM and TEM micrographs. It was found that an increase in enthalpy and a higher H2:MTS ratio resulted in smaller SiC particle sizes. The adhesion of particles was a common ocuurence during the process, resulting in larger agglomerate sizes.en_ZA
dc.description.librarianhb2015en_ZA
dc.description.librarianmi2025en
dc.description.sdgSDG-09: Industry, innovation and infrastructureen
dc.description.sdgSDG-07: Affordable and clean energyen
dc.description.sponsorshipSouth African National Research Foundationen_ZA
dc.description.urihttp://www.elsevier.com/locate/ceramint/en_ZA
dc.identifier.citationVan Laar, JH, Slabber, JFM, Meyer, JP, Van der Walt, IJ, Puts, GJ & Crouse, PL 2015, 'Microwave-plasma synthesis of nano-sized silicon carbide at atmospheric pressure', Ceramics International, vol. 41, no. 3, part B, pp. 4326–4333.en_ZA
dc.identifier.issn0272-8842 (print)
dc.identifier.issn1873-3956 (online)
dc.identifier.other10.1016/j.ceramint.2014.11.121
dc.identifier.urihttp://hdl.handle.net/2263/43439
dc.language.isoenen_ZA
dc.publisherElsevieren_ZA
dc.rights© 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved. Notice : this is the author’s version of a work that was accepted for publication in Ceramics International. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Ceramics International, vol. 41, no. 3, part B, pp. 4326–4333, 2015. doi : 10.1016/j.ceramint.2014.11.121.en_ZA
dc.subjectSilicon carbideen_ZA
dc.subjectMicrowave plasmaen_ZA
dc.subjectNanoparticlesen_ZA
dc.subjectMethyltrichlorosilane (MTS)en_ZA
dc.subject.otherEngineering, built environment and information technology articles SDG-09
dc.subject.otherSDG-09: Industry, innovation and infrastructure
dc.subject.otherEngineering, built environment and information technology articles SDG-07
dc.subject.otherSDG-07: Affordable and clean energy
dc.titleMicrowave-plasma synthesis of nano-sized silicon carbide at atmospheric pressureen_ZA
dc.typePostprint Articleen_ZA

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