Migration behaviour of selenium implanted into polycrystalline 3C–SiC

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dc.contributor.author Abdalla, Zaki Adam Yousif
dc.contributor.author Ismail, Mahjoub Yagoub Abdalla
dc.contributor.author Njoroge, Eric Gitau
dc.contributor.author Hlatshwayo, Thulani Thokozani
dc.contributor.author Wendler Elke
dc.contributor.author Malherbe, Johan B.
dc.date.accessioned 2020-04-02T08:06:54Z
dc.date.issued 2020-05
dc.description.abstract Please read abstract in the article. en_ZA
dc.description.department Physics en_ZA
dc.description.embargo 2021-05-01
dc.description.librarian hj2020 en_ZA
dc.description.sponsorship The National Research Foundation and The World Academy of Science. en_ZA
dc.description.uri http://www.journals.elsevier.com/vacuum en_ZA
dc.identifier.citation Abdalla, Z.A.Y., Ismail, M.Y.A., Njoroge, E.G. et al. 2020, 'Migration behaviour of selenium implanted into polycrystalline 3C–SiC', Vacuum, vol. 175, art. 109235, pp. 1-6. en_ZA
dc.identifier.issn 0042-207X (print)
dc.identifier.issn 1879-2715 (online)
dc.identifier.other 10.1016/j.vacuum.2020.109235
dc.identifier.uri http://hdl.handle.net/2263/73909
dc.language.iso en en_ZA
dc.publisher Elsevier en_ZA
dc.rights © 2020 Elsevier Ltd. All rights reserved. Notice : this is the author’s version of a work that was accepted for publication in Vacuum. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. A definitive version was subsequently published in Vacuum, vol. 175, art. 109235, pp. 1-6, 2020. doi : 10.1016/j.vacuum.2020.109235. en_ZA
dc.subject Diffusion en_ZA
dc.subject Polycrystalline en_ZA
dc.subject Silicon carbide (SiC) en_ZA
dc.subject Raman spectroscopy en_ZA
dc.subject Rutherford backscattering spectrometry (RBS) en_ZA
dc.subject Scanning electron microscopy (SEM) en_ZA
dc.title Migration behaviour of selenium implanted into polycrystalline 3C–SiC en_ZA
dc.type Postprint Article en_ZA


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