dc.contributor.author |
Langa, Dolly Frans
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dc.contributor.author |
Van der Berg, Nic (Nicolaas George)
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dc.contributor.author |
Friedland, Erich Karl Helmuth
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dc.contributor.author |
Malherbe, Johan B.
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dc.contributor.author |
Botha, A.J.
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dc.contributor.author |
Chakraborty, P.
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dc.contributor.author |
Wendler, E.
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dc.contributor.author |
Wesch, W.
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dc.date.accessioned |
2013-05-14T13:03:31Z |
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dc.date.available |
2013-05-14T13:03:31Z |
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dc.date.issued |
2012-02-15 |
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dc.description.abstract |
The effect of annealing temperature on the surface morphology and on the diffusion of cesium ions implanted into glassy carbon (Sigradur® G) is reported. The samples were implanted with 360 keV cesium ions to a fluence of 2 × 1016 ions/cm2 at room temperature, at 350 and at 600 °C. The room temperature implanted samples were isochronally vacuum annealed for 1 h at temperatures from 200 to 600 °C. All samples were studied by Rutherford backscattering scattering (RBS) and scanning electron microscopy (SEM).
During implantation a strong redistribution of the cesium ions towards the surface is observed, which occurs already at room temperature and enhances at elevated temperatures. However, almost no cesium ions are lost in that process. Contrary, annealing at elevated temperatures results not only in a diffusion and redistribution of cesium, but also in a significant sublimation/evaporation of cesium into the vacuum. This suggests that during implantation some meta-stable compound is formed which prevents a cesium loss. SEM pictures of the samples show that implantation and subsequent annealing strongly influence the surface structure of the glassy carbon. |
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dc.description.librarian |
hb2013 |
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dc.description.librarian |
ai2013 |
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dc.description.sponsorship |
Financial support of the National Research Foundation and the Bundesministerium für Bildung und Forschung (Germany) is gratefully acknowledged. |
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dc.description.uri |
http://www.elsevier.com/locate/nimb |
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dc.identifier.citation |
Langa, DF, Van der Berg, NG, Friedland, E, Malherbe, JB, Botha, AJ, Chakraborty, P, Wendler, E & Wesch, W 2012, 'Heat treatment of glassy carbon implanted with cesium at room and high temperatures', Nuclear Instruments & Methods in Physics Research Section B - Beam Interactions with Materials and Atoms, vol. 273, no. 2, pp. 68-72. |
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dc.identifier.issn |
0168-583X (print) |
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dc.identifier.issn |
1872-9584 (online) |
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dc.identifier.other |
10.1016/j.nimb.2011.07.041 |
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dc.identifier.uri |
http://hdl.handle.net/2263/21485 |
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dc.language.iso |
en |
en |
dc.publisher |
Elsevier |
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dc.rights |
© 2013 Elsevier Ltd. All rights reserved. Notice : this is the author’s version of a work that was accepted for publication in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms.Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, vol. 273, issue 2, 2012, DOI : 10.1016/j.nimb.2011.07.041 |
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dc.subject |
Glassy Carbon (SIGRADURÒ) |
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dc.subject |
Rutherford backscattering scattering (RBS) |
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dc.subject |
Scanning electron microscopy (SEM) |
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dc.subject |
Diffusion |
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dc.subject |
Surface topography |
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dc.subject.lcsh |
Carbon -- Heat treatment |
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dc.subject.lcsh |
Cesium ions -- Heat treatment |
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dc.title |
Heat treatment of glassy carbon implanted with cesium at room and high temperatures |
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dc.type |
Postprint Article |
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