The influence of the gap between the gas inlet and the substrate in an in-house developed
thermal chemical vapour deposition (CVD) reactor, on the growth rate, surface morphology,
phase composition and microstructure of ...
Biira, Saphina; Crouse, Philippus L.; Bissett, H.; Alawad, B.A.B.; Hlatshwayo, Thulani Thokozani; Nel, J.T.; Malherbe, Johan B.(Elsevier, 2017-02)
A chemical vapour deposition process using radio frequency induction heating operating at atmospheric pressure
was developed for the deposition of ZrC coatings. The precursors utilised in this process were zirconium ...
