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Controlled etching of the SiC layer in TRISO coated particles using CF4 in a non-thermal plasma
Koen, Reiner
;
Van der Walt, Isak
;
Jansen, Arnold Alexander
;
Crouse, Philippus L.
(
AOSIS Open Journals
,
2020-04-03
)
Plasmategnologie : ’n kort oorsig oor die ontstaan, teorie en ’n aantal toepassings daarvan
Jansen, Arnold Alexander
;
Van der Walt, Izak Jacobus
;
Crouse, Philippus L.
(
AOSIS Open Journals
,
2020-04-03
)
Treatment of TRISO-coated particles with CF4 in a low temperature plasma
Van der Walt, Izak Jacobus
;
Nel, Johannes T.
;
Crouse, Philippus L.
;
Jansen, Arnold Alexander
;
Kekana, Sipho J.
(
Elsevier
,
2011-06
)
Waste-tyre pyrolysis and gasification via the reverse Boudouard reaction : derivation of empirical kinetics from TGA data
Jansen, Arnold Alexander
;
Van der Walt, Izak Jacobus
;
Crouse, Philippus L.
(
Elsevier
,
2022-02
)
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Author
Crouse, Philippus L. (4)
Jansen, Arnold Alexander (4)
Van der Walt, Izak Jacobus (3)
Kekana, Sipho J. (1)
Koen, Reiner (1)
Nel, Johannes T. (1)
Van der Walt, Isak (1)
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Etching (2)
Gasification (2)
Afval vernietiging (1)
Dissolution (Chemistry) (1)
Energieproduksie (1)
Energy production (1)
Etsing (1)
Kinetics (1)
Nie-oordragboog (1)
Nie-termiese CF4 plasma (1)
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2020 - 2022 (3)
2011 - 2019 (1)
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