Browsing Physics by Author "Abrass, Hameda A."

Browsing Physics by Author "Abrass, Hameda A."

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  • Abrass, Hameda A.; Theron, C.C. (Chris); Njoroge, E.G. (Eric); Van der Berg, Nic (Nicolaas George); Botha, A.J.; Yan, X- L.; Terblans, J.J. (Elsevier, 2015-09)
    The reaction between a thin film (126 nm) of Co and Si has been studied at 450 C for 24 h under high vacuum conditions, in the presence of a FeZr barrier layer. Without a diffusion barrier layer between Co and Si, Co2Si ...
  • Abrass, Hameda A. (University of Pretoria, 2016)
    Silicon (Si) has various applications in different technological fields as a structural material or a semiconductor. Cobalt disilicide is an attractive silicide for contact with Si because it has favourable properties such ...