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Browsing Physics by Author "Biira, Saphina"
Now showing items 1-8 of 8
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Biira, Saphina (University of Pretoria, 2017)Generation IV high temperature nuclear reactors use TRISO (tristructural isotropic) particles for containment of radioactive fission products. In these particles silicon carbide (SiC) is the main barrier for containing ...
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Biira, Saphina; Crouse, Philippus L.; Bissett, H.; Hlatshwayo, Thulani Thokozani; Van Laar, Jean H.; Malherbe, Johan B. (Southern African Institute of Mining and Metallurgy, 2017-10)The overall aim of this research project was to design and construct an inhouse, thermal chemical vapour deposition (CVD) reactor system, operating at atmospheric pressure. Radio frequency (RF) induction heating was ...
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Mirzayev, Matlab Nabi; Mehdiyeva, Ravan Nadir; Melikova, Sevinj Zellabdin; Jabarov, Sakin Hamid; Thabethe, Thabsile Theodora; Biira, Saphina; Kurbanov, Mirze Abdulla; Tiep, Nguyen Van (Springer, 2019-02)Please read abstract in the article.
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Biira, Saphina; Alawad, B.A.B.; Bissett, H.; Nel, J.T.; Ntsoane, Tshepo Paul; Hlatshwayo, Thulani Thokozani; Crouse, Philippus L.; Malherbe, Johan B. (Elsevier, 2017-01)The influence of the gap between the gas inlet and the substrate in an in-house developed thermal chemical vapour deposition (CVD) reactor, on the growth rate, surface morphology, phase composition and microstructure of ...
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Thabethe, Thabsile Theodora; Ntsoane, Tshepo Paul; Biira, Saphina; Njoroge, Eric Gitau; Hlatshwayo, Thulani Thokozani; Skuratov, Vladimir Alexeevich; Malherbe, Johan B. (Elsevier, 2020-04)Please read abstract in the article.
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Thabethe, Thabsile Theodora; Nstoane, T.; Biira, Saphina; Njoroge, Eric Gitau; Hlatshwayo, Thulani Thokozani; Skuratov, Vladimir Alexeevich; Malherbe, Johan B. (Elsevier, 2019-03)Please read abstract in the article.
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Biira, Saphina; Crouse, Philippus L.; Bissett, H.; Alawad, B.A.B.; Hlatshwayo, Thulani Thokozani; Nel, J.T.; Malherbe, Johan B. (Elsevier, 2017-02)A chemical vapour deposition process using radio frequency induction heating operating at atmospheric pressure was developed for the deposition of ZrC coatings. The precursors utilised in this process were zirconium ...
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Biira, Saphina; Crouse, Philippus L.; Hlatshwayo, Thulani Thokozani; Njoroge, Eric Gitau; Nel, J.T.; Ntsoane, Tshepo Paul; Malherbe, Johan B. (Elsevier, 2017-12)ZrC layers were deposited in a chemical vapour deposition (CVD) reactor on graphite substrates using a ZrCl4-Ar-CH4-H2 precursor mixture. The deposition was conducted at different ZrCl4 partial pressures at a constant ...
Now showing items 1-8 of 8