Novel thermally reduced graphene oxide microsupercapacitor fabricated via mask free axidraw direct writing

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dc.contributor.author Maphiri, Vusani Muswa
dc.contributor.author Rutavi, Gift
dc.contributor.author Sylla, Ndeye Fatou
dc.contributor.author Adewinbi, Saheed A.
dc.contributor.author Fasakin, Oladepo
dc.contributor.author Manyala, Ncholu I.
dc.date.accessioned 2022-02-04T08:08:38Z
dc.date.available 2022-02-04T08:08:38Z
dc.date.issued 2021-07
dc.description.abstract We demonstrate a simple method to fabricate all solid state, thermally reduced graphene oxide (TRGO) microsupercapacitors (µ-SCs) prepared using the atmospheric pressure chemical vapor deposition (APCVD) and a mask-free axiDraw sketching apparatus. The Fourier transform infrared spectroscopy (FTIR) shows the extermination of oxygen functional groups as the reducing temperature (RT) increases, while the Raman shows the presence of the defect and graphitic peaks. The electrochemical performance of the µ-SCs showed cyclic voltammetry (CV) potential window of 0–0.8 V at various scan rates of 5–1000 mVs−1 with a rectangular shape, depicting characteristics of electric double layer capacitor (EDLC) behavior. The µ-SC with 14 cm−2 (number of digits per unit area) showed a 46% increment in capacitance from that of 6 cm−2 , which is also higher than the µ-SCs with 22 and 26 cm−2 . The TRGO-500 exhibits volumetric energy and power density of 14.61 mW h cm−3 and 142.67 mW cm−3 , respectively. The electrochemical impedance spectroscopy (EIS) showed the decrease in the equivalent series resistance (ESR) as a function of RT due to reduction of the resistive functional groups present in the sample. Bode plot showed a phase angel of −85◦ for the TRGO-500 µ-SC device. The electrochemical performance of the µ-SC devices can be tuned by varying the RT, number of digits per unity area, and connection configuration (parallel or series). en_ZA
dc.description.department Physics en_ZA
dc.description.librarian pm2022 en_ZA
dc.description.sponsorship The National Research Foundation (NRF) of South Africa, the South African Research Chairs Initiative (SARChI) of the Department of Science and Technology and the University of Pretoria. en_ZA
dc.description.uri http://www.mdpi.com/journal/nanomaterials en_ZA
dc.identifier.citation Maphiri, V.M.; Rutavi, G.; Sylla, N.F.; Adewinbi, S.A.; Fasakin, O.; Manyala, N. Novel Thermally Reduced Graphene Oxide Microsupercapacitor Fabricated via Mask—Free AxiDraw Direct Writing. Nanomaterials 2021, 11, 1909. https://doi.org/10.3390/nano11081909. en_ZA
dc.identifier.issn 2079-4991 (online)
dc.identifier.other 10.3390/nano11081909
dc.identifier.uri http://hdl.handle.net/2263/83623
dc.language.iso en en_ZA
dc.publisher MDPI en_ZA
dc.rights © 2021 by the authors. Licensee: MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https:// creativecommons.org/licenses/by/ 4.0/). en_ZA
dc.subject Microsupercapacitor en_ZA
dc.subject Direct writing en_ZA
dc.subject Energy storage en_ZA
dc.subject Graphene oxide en_ZA
dc.subject Thermally reduced graphene oxide (TRGO) en_ZA
dc.subject Atmospheric pressure chemical vapor deposition (APCVD) en_ZA
dc.subject Fourier transform infrared spectroscopy (FTIR) en_ZA
dc.subject Raman spectroscopy en_ZA
dc.subject Equivalent series resistance (ESR) en_ZA
dc.subject Electrochemical impedance spectroscopy (EIS) en_ZA
dc.title Novel thermally reduced graphene oxide microsupercapacitor fabricated via mask free axidraw direct writing en_ZA
dc.type Article en_ZA


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