dc.contributor.author |
Igumbor, Emmanuel
|
|
dc.contributor.author |
Danga, Helga Tariro
|
|
dc.contributor.author |
Omotoso, Ezekiel
|
|
dc.contributor.author |
Meyer, Walter Ernst
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|
dc.date.accessioned |
2019-06-26T07:19:58Z |
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dc.date.issued |
2019-03 |
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dc.description.abstract |
Please read abstract in the article. |
en_ZA |
dc.description.department |
Physics |
en_ZA |
dc.description.embargo |
2020-03-01 |
|
dc.description.librarian |
hj2019 |
en_ZA |
dc.description.sponsorship |
The National Research Foundation (NRF) of South Africa (Grant specific unique reference number (UID) 98961). Emmanuel Igumbor acknowledge the University of South Africa for financial support through the Postdoctoral Research Fellowship programme. |
en_ZA |
dc.description.uri |
http://www.elsevier.com/locate/nimb |
en_ZA |
dc.identifier.citation |
Igumbor, E., Danga, H.T., Omotoso, E. et al. 2019, 'Defect levels induced by double substitution of B and N in 4H-SiC', Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, vol. 442, pp. 41-46. |
en_ZA |
dc.identifier.issn |
0168-583X (print) |
|
dc.identifier.issn |
1872-9584 (online) |
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dc.identifier.other |
10.1016/j.nimb.2019.01.014 |
|
dc.identifier.uri |
http://hdl.handle.net/2263/70300 |
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dc.language.iso |
en |
en_ZA |
dc.publisher |
Elsevier |
en_ZA |
dc.rights |
© 2019 Elsevier B.V. All rights reserved. Notice : this is the author’s version of a work that was accepted for publication in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. A definitive version was subsequently published in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, vol. 442, pp. 41-46, 2019. doi : 10.1016/j.nimb.2019.01.014. |
en_ZA |
dc.subject |
Charge state |
en_ZA |
dc.subject |
Defect |
en_ZA |
dc.subject |
Uranium compounds |
en_ZA |
dc.subject |
Substitutional impurities |
en_ZA |
dc.subject |
Hybrid functional |
en_ZA |
dc.subject |
Formation energy |
en_ZA |
dc.subject |
Substitution |
en_ZA |
dc.subject |
Equilibrium conditions |
en_ZA |
dc.subject |
Electrically active defects |
en_ZA |
dc.subject |
Double substitution |
en_ZA |
dc.subject |
Conduction-band minimum |
en_ZA |
dc.subject |
Substitution reactions |
en_ZA |
dc.subject |
Silicon compounds |
en_ZA |
dc.subject |
Silicon carbide |
en_ZA |
dc.subject |
Energy gap |
en_ZA |
dc.title |
Defect levels induced by double substitution of B and N in 4H-SiC |
en_ZA |
dc.type |
Postprint Article |
en_ZA |