Kinetics of growth of thin-films of Co2Si, Ni2Si, WSi2 and VSi2 during a reactive diffusion process

We are excited to announce that the repository will soon undergo an upgrade, featuring a new look and feel along with several enhanced features to improve your experience. Please be on the lookout for further updates and announcements regarding the launch date. We appreciate your support and look forward to unveiling the improved platform soon.

Files in this item

This item appears in the following Collection(s)