Investigation of the diffusion behaviour of aliminium in different semiconductors

dc.contributor.advisor	Friedland, Erich Karl Helmuth	en
dc.contributor.postgraduate	Hauser, Thilo Michael	en
dc.date.accessioned	2013-09-07T17:55:14Z
dc.date.available	2006-12-04	en
dc.date.available	2013-09-07T17:55:14Z
dc.date.created	1999-12-01	en
dc.date.issued	2006-12-04	en
dc.date.submitted	2006-12-04	en
dc.description	Thesis (PhD (Physics))--University of Pretoria, 2006.	en
dc.description.abstract	Please read the abstract in the section 00front of this document	en
dc.description.availability	unrestricted	en
dc.description.department	Physics	en
dc.identifier.citation	Hauser TM, 1999, Investigation of the diffusion behaviour of aluminium in different semiconductors, PhD thesis, University of Pretoria, Pretoria, viewed yymmdd < http://hdl.handle.net/2263/30090 >	en
dc.identifier.other	H573/th	en
dc.identifier.upetdurl	http://upetd.up.ac.za/thesis/available/etd-12042006-134717/	en
dc.identifier.uri	http://hdl.handle.net/2263/30090
dc.language.iso		en
dc.publisher	University of Pretoria	en_ZA
dc.rights	© 1999 University of Pretoria. All rights reserved. The copyright in this work vests in the University of Pretoria. No part of this work may be reproduced or transmitted in any form or by any means, without the prior written permission of the University of Pretoria.	en
dc.subject	Electronic circuits	en
dc.subject	Aluminum	en
dc.subject	Semiconductors diffusion	en
dc.subject	UCTD	en_US
dc.title	Investigation of the diffusion behaviour of aliminium in different semiconductors	en
dc.type	Thesis	en