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Browsing UP Experts (Danie Auret Collection) by Subject "Ar plasma etching"

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Electronic and annealing properties of the E0.31 defect introduced during Ar plasma etching of germanium

Auret, Francois Danie; Coelho, Sergio M.M.; Myburg, G.; Janse van Rensburg, Pieter Johan; Meyer, Walter Ernst (Elsevier, 2009)

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