Electronic and annealing properties of the E0.31 defect introduced during Ar plasma etching of germanium

Electronic and annealing properties of the E0.31 defect introduced during Ar plasma etching of germanium

Auret, Francois Danie; Coelho, Sergio M.M.; Myburg, G.; Janse van Rensburg, Pieter Johan; Meyer, Walter Ernst
URI: http://hdl.handle.net/2263/11683
Date: 2009

Abstract:

Please read abstract in article.

Show full item record

Files in this item

Icon
Name: Auret_Electronic( ...
Size: 199.6Kb
Format: PDF
Description: Postprint Article
View/Open

This item appears in the following Collection(s)