Effect of exposing Se pre-implanted polycrystalline SiC to maximum electronic energy loss of 33.7 keV/nm and annealing

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dc.contributor.author Mabelane, T.S.
dc.contributor.author Abdalla, Zaki Adam Yousif
dc.contributor.author Skuratov, V.A.
dc.contributor.author Ntshangase, S.S.
dc.contributor.author Masikane, S.C.
dc.contributor.author Hlatshwayo, Thulani Thokozani
dc.date.accessioned 2025-04-22T10:58:15Z
dc.date.available 2025-04-22T10:58:15Z
dc.date.issued 2025-05
dc.description DATA AVAILABILITY : Data will be made available on request. en_US
dc.description.abstract Please read abstract in the article. en_US
dc.description.department Physics en_US
dc.description.librarian hj2025 en_US
dc.description.sdg SDG-07:Affordable and clean energy en_US
dc.description.sponsorship The National Research Foundation (NRF) of South Africa. en_US
dc.description.uri https://www.sciencedirect.com/journal/surfaces-and-interfaces en_US
dc.identifier.citation Mabelane, T.S., Abdalla, Z.A.Y., Skuratov, V.A. et al. 2025, 'Effect of exposing Se pre-implanted polycrystalline SiC to maximum electronic energy loss of 33.7 keV/nm and annealing', Surfaces and Interfaces, vol. 64, art. 106376, pp. 1-11, doi : 10.1016/j.surfin.2025.106376. en_US
dc.identifier.issn 2468-0230 (online)
dc.identifier.other 10.1016/j.surfin.2025.106376
dc.identifier.uri http://hdl.handle.net/2263/102175
dc.language.iso en en_US
dc.publisher Elsevier en_US
dc.rights © 2025 The Author(s). Published by Elsevier B.V. This is an open access article under the CC BY-NC license (http://creativecommons.org/licenses/by- nc/4.0/). en_US
dc.subject Swift heavy ion (SHI) en_US
dc.subject Silicon carbide (SiC) en_US
dc.subject Selenium en_US
dc.subject Annealing en_US
dc.subject Recrystallization en_US
dc.subject SDG-07: Affordable and clean energy en_US
dc.title Effect of exposing Se pre-implanted polycrystalline SiC to maximum electronic energy loss of 33.7 keV/nm and annealing en_US
dc.type Article en_US


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