Growth of graphene underlayers by chemical vapor deposition

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dc.contributor.author Fabiane, Mopeli
dc.contributor.author Khamlich, Saleh
dc.contributor.author Bello, Abdulhakeem
dc.contributor.author Dangbegnon, Julien K.
dc.contributor.author Momodu, Damilola Y.
dc.contributor.author Johnson, Alan T. Charlie
dc.contributor.author Manyala, Ncholu I.
dc.date.accessioned 2014-02-04T13:40:27Z
dc.date.available 2014-02-04T13:40:27Z
dc.date.issued 2013-11
dc.description.abstract We present a simple and very convincing approach to visualizing that subsequent layers of graphene grow between the existing monolayer graphene and the copper catalyst in chemical vapor deposition (CVD). Graphene samples were grown by CVD and then transferred onto glass substrates by the bubbling method in two ways, either direct-transfer (DT) to yield poly (methyl methacrylate) (PMMA)/graphene/glass or (2) inverted transfer (IT) to yield graphene/PMMA/glass. Field emission scanning electron microscopy (FE-SEM) and atomic force microscopy (AFM) were used to reveal surface features for both the DT and IT samples. The results from FE-SEM and AFM topographic analyses of the surfaces revealed the underlayer growth of subsequent layers. The subsequent layers in the IT samples are visualized as 3D structures, where the smaller graphene layers lie above the larger layers stacked in a concentric manner. The results support the formation of the so-called “inverted wedding cake” stacking in multilayer graphene growth. en
dc.description.librarian hb2014 en
dc.description.librarian ai2014
dc.description.sponsorship MF thanks the Government of Lesotho, the University of Pretoria and the NRF for financial support for his study. A.T.C.J acknowledges support from the LRSM, through the U.S. National Science Foundation MRSEC, Grant No. DMR-1120901. en
dc.description.uri http://scitation.aip.org/content/aip/journal/adva en
dc.identifier.citation Fabiane, M, Khamlich, S, Bello, A, Dangbegnon, J, Momodu, D, Johnson, ATC & Manyala, N 2013, 'Growth of graphene underlayers by chemical vapor deposition', AIP Advances, vol. 3, no. 11, art. no. 112126, pp. 1-8. en
dc.identifier.issn 2158-3226 (online)
dc.identifier.other 10.1063/1.4834975
dc.identifier.uri http://hdl.handle.net/2263/33296
dc.language.iso en en
dc.publisher American Institute of Physics en
dc.rights © Author(s) 2014. This work is distributed under the Creative Commons Attribution 3.0 Unported license. en
dc.subject Graphene underlayers en
dc.subject.lcsh Chemical vapor deposition en
dc.subject.lcsh Graphene en
dc.title Growth of graphene underlayers by chemical vapor deposition en
dc.type Article en


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